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News About Anvik's Upcoming Trade Exhibitions, Recent Press Releases, New Technical Articles, and Recently Announced Products and Services
| May '10 | Anvik President Kanti Jain's Pioneering Development of Excimer Laser Lithography Featured in 50 Years of Laser History Milestones |
| Apr. '09 | U.S. Patent Office reconfirms key Anvik patent on large-area lithography technology in response to reexamination filing by Nikon |
| Feb. '09 | Anvik president Kanti Jain elected to the U.S. National Academy of Engineering |
| Dec. '08 | ABC News Good Morning America features Anvik's patent infringement lawsuits against Nikon, Samsung, LG.Philips and other manufacturers |
| Nov. '08 | Anvik introduces low-cost stepper for lithography and photoablation R&D |
| Jun. '08 | Anvik Corporation awarded its 60th patent |
| Apr. '08 | Anvik files patent infringement lawsuits against flat-panel display and television manufacturers Toshiba, Matsushita, Hitachi, and IPS Alpha |
| Mar. '08 | Anvik president Kanti Jain awarded David Richardson Medal of Optical Society of America |
| Feb. '07 | Anvik files patent infringement lawsuits against Samsung, Sharp, LG.Philips, CMO, AUO, CPT, and other flat-panel display and television manufacturers |
| Feb. '06 | Anvik president Kanti Jain elected Fellow of IEEE |
| Jan. '06 | University of Illinois at Urbana-Champaign appoints Anvik president Kanti Jain Professor of Electrical and Computer Engineering |
| Oct. '05 | Anvik files patent infringement lawsuit against Nikon |
| Mar. '05 | Anvik Corporation awarded its 50th patent |
May 2010
Anvik President Kanti Jain's Pioneering Development of Excimer Laser Lithography Featured in 50 Years of Laser History Milestones
Washington, DC -- Since the laser was first demonstrated in 1960, it has found innumerable applications in science, industry, consumer products, and medicine. To commemorate the 50th anniversary of the development of the laser, the American Physical Society (APS), in partnership with the Optical Society of America (OSA), SPIE-The International Society for Optical Engineering, and the Institute of Electrical and Electronics Engineers (IEEE)-Photonics, is spearheading a year-long celebration of this historic event, described in their informative website LaserFest (www.laserfest.org). To highlight 50 years of innovations in lasers and laser applications, the website presents a Timeline of Laser History Milestones (www.laserfest.org/lasers/history/timeline.cfm). Anvik Corporation is proud to note that among the key milestones in this Timeline is the invention and demonstration of excimer laser lithography in 1982 by the Company's president, Dr. Kanti Jain. Developed by him at the I.B.M. San Jose Research Laboratory (now the I.B.M. Almaden Research Center), excimer laser lithography is now the predominant lithography technology used worldwide in the fabrication of microchips (integrated circuits) for the computer and electronics industry, totaling $400 billion in annual production. The Engineering and Physical Sciences Research Council (EPSRC) of U.K., in their commemorative document "Lasers in Our Lives: 50 Years of Impact" (www.stfc.ac.uk/Resources/PDF/Lasers50_final1.pdf), has also featured Dr. Jain's work in their "50 Years of Lasers Timeline." For his pioneering work, among the many honors he has received are Outstanding Innovation Awards from I.B.M., the David Richardson Medal from OSA, and election to the U.S. National Academy of Engineering (NAE).
April 8, 2009
U.S. Patent Office reconfirms key Anvik patent on large-area lithography technology in response to reexamination filing by Nikon
Washington, DC -- The United State Patents and Trademarks Office (USPTO) has issued a "Notice of Intent to Issue a Reexamination Certification" for Anvik Corporation's U.S. Patent 4,924,257 in response to a reexamination request filed by Nikon Corporation. The Reexamination Certification by the USPTO reconfirms the validity of all claims that were challenged by Nikon and the Anvik patent retains all of its claims as originally issued on May 8, 1990. This key patent is one of five Anvik patents on large-area lithography systems and methods that are the subject of patent infringement lawsuits filed by Anvik Corporation against Nikon, Samsung, LG.Philips and several other manufacturers of flat-panel televisions, computer monitors and displays. The lawsuits by Anvik were filed in 2005, 2007 and 2008 (see www.anvik.com/news.html#lawsuit-nikon, www.anvik.com/news.html#lawsuit-samsung-etal, and www.anvi.com/news.html#lawsuit-ips-etal). The reexamination request was filed by Nikon in 2007 during the course of these ongoing lawsuits -- 17 years after the issuance of Anvik patent 2,924,257. The Notice of Intent to Issue a Reexamination Certification confirming Anvik's claims was issued by USPTO on April 8, 2009.
Click here for a pdf copy of the USPTO decision.
February 2009
Anvik president Kanti Jain elected to the U.S. National Academy of Engineering
Washington, DC -- Dr. Kanti Jain, president of Anvik Corporation and professor of Electrical and Computer Engineering at the University of Illinois at Urbana-Champaign, has been elected to the U.S. National Academy of Engineering (NAE). Election to the NAE is among the highest professional distinctions in engineering. NAE was established in 1964 under a charter from the National Academy of Sciences as a parallel organization of outstanding engineers.
Dr. Jain is specifically honored "For contributions to the development of high-resolution, deep-ultraviolet excimer lithography for microelectronic fabrication." Excimer laser lithography systems are now used worldwide for semiconductor integrated circuit manufacturing. Dr. Ilesanmi Adesida, dean of the College of Engineering at the University of Illinois at Urbana-Champaign, explained, "Professor Kanti Jain's contributions are fundamental to how semiconductor devices and chips are manufactured today. His work has broad impact on computers, cell phones, and many modern day tools and conveniences. It is fitting that he is being elected into the Academy for his achievements." In addition, at Anvik Corporation, Dr. Jain and his team developed the technologies for large-area lithography that are widely used today in the production of flat-panel displays and televisions.
December 1, 2008
ABC News Good Morning America features Anvik's patent infringement lawsuits against Nikon, Samsung, LG.Philips and other manufacturers
New York, NY -- The Good Morning America television program of ABC News ran a story on Anvik Corporation's ongoing lawsuits against Nikon, Samsung, LG.Philips and other manufacturers of flat-panel televisions, computer monitors and displays. (see www.anvik.com/news.html#lawsuit-nikon, www.anvik.com/news.html#lawsuit-samsung-etal, and www.anvi.com/news.html#lawsuit-ips-etal). The lawsuits against these defendants were filed by Anvik for infringement of five of its key patents that cover large-area microlithography systems and methods used in the manufacturing of the vast majority of such flat-screen products sold worldwide.
Full story: abcnews.go.com/GMA
November 2008
Anvik introduces low-cost mini-stepper for lithography and photoablation R&D and prototyping
Hawthorne, New York
Anvik Corporation has introduced the NexStep 1020 SXE microlithography and photoablation system, a revolutionary advance in multifunction laser processing systems. It is a low-cost step-and repeat tool designed for R&D and prototyping. It offers the unique combination of high-resolution projection lithography in photoresists, photoablation in polymers, and high-fluence materials processing of semiconductors and other materials, making it the ideal patterning tool for prototyping and pilot production as well as exploration of new frontiers in micro-optics, optoelectronics, MEMS, microfluidics, and biophotonics in a multi-user, multidisciplinary environment.
For further information, see: NexStep 1020 SXE Brochure or send inquiy to: info@anvik.com
June 24, 2008
Anvik Corporation awarded its 60th patent
HIGH-BRIGHTNESS, COMPACT ILLUMINATOR WITH INTEGRATED OPTICAL ELEMENTS
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Hawthorne, NY -- Anvik Corporation has been awarded its 60th patent. Issued on June 24, 2008 to inventor Kanti Jain, U.S. Pat. 7,390,116 describes advances made by Anvik in light sources and illumination systems for optical projection, and specifically relates to such applications in which it is important to maximize the light collection from a source lamp, to minimize the size and power requirement of the lamp, to make the spatial uniformity of the lamp's light beam high, and to collect the light within a specified numerical aperture so as to optimize the imaging performance of the projection system. An attractive application of the invention is in electronic digital projectors. This patent further strengthens Anvik's intellectual property portfolio in optical imaging and microelectronics manufacturing technologies, which now includes 68 patents, of which 61 have been issued or allowed and 7 are pending. Anvik's business in microelectronics manufacturing systems is based on its diverse patent portfolio that comprises major innovations in optical system designs, microlithography processes and tools, opto-mechanical devices, energy-efficiency technologies, and laser materials processing systems.
See: Patent Portfolio
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April 29, 2008
Anvik files patent infringement lawsuits against flat-panel display and television manufacturers Toshiba, Matsushita, Hitachi, and IPS Alpha
Hawthorne, New York
Anvik Corporation has filed lawsuits against several additional major manufacturers of flat-panel displays and televisions in Japan and their U.S. subsidiaries, including Toshiba Corporation, Matsushita Electric Industrial Co., Ltd., Hitachi, Ltd., and IPS Alpha Technology, Ltd., for infringement of five Anvik patents that cover inventions in high-performance microlithography systems. Such systems are critical tools for manufacturing of microelectronics products, including flat-panel displays, televisions, semiconductor integrated circuits, and microelectronic packaging devices. The lawsuits were filed April 29, 2008 in the U.S. District Court for the Southern District of New York, White Plains Division.
The present lawsuits follow the complaints Anvik filed on February 2, 2007 against Samsung Electronics Co. Ltd. (Korea), Sharp Corporation (Japan), LG.Philips LCD Co., Ltd. (Korea), Chi Mei Optoelectronics (Taiwan), AU Optronics Corporation (Taiwan), Chunghwa Picture Tubes, Ltd. (Taiwan), Tatung Company (Taiwan), Toppan Printing Co., Ltd. (Japan), HannStar Display Corporation (Taiwan), Innolux Display Corporation (Taiwan), and AFPD PTE Ltd. (Singapore).
The inventions described and claimed in the patents are incorporated in Anvik's own microlithography systems that enable cost-effective, high-volume manufacture of a wide array of microelectronic and display products.
Anvik, based in Hawthorne, New York, is a producer of advanced microlithography and photoablation systems for high-throughput manufacturing of microelectronic devices, flat-panel displays, and flexible electronics. Anvik has advanced the state of the art of microlithography and materials processing systems for microelectronics manufacturing, and has made and installed such equipment in the U.S. and abroad.
In these lawsuits, Anvik is represented by the law firms of Bernstein Litowitz Berger & Grossman, LLP and Cozen O'Connor.
For further information, send inquiy to: info@anvik.com
March 2008
Anvik president Kanti Jain awarded David Richardson Medal of Optical Society of America
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Washington, DC -- Dr. Kanti Jain, president of Anvik Corporation, has been awarded the David Richardson Medal by the Board of Directors of the Optical Society of America for achievements in the field of optical engineering. Each year OSA presents the award to one individual chosen for his "dedication, ingenuity, and perseverance in attaining the highest level of scientific achievement in their chosen fields." The award recognizes those who have had significant influence primarily in the commercial and industrial sector of optical engineering. Dr. Jain is specifically honored for his "pioneering contributions to the development of high-resolution optical microlithography technologies, especially for the invention and development of excimer laser lithography technologies and systems for production of microelectronic devices," according to the OSA citation. Excimer laser lithography systems are now used worldwide for semiconductor integrated circuit manufacturing. In addition, at Anvik, Dr. Jain and his team developed the technologies for large-area lithography that are widely used today in the production of flat-panel displays and televisions.
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February 2, 2007
Anvik files patent infringement lawsuits against Samsung, Sharp, LG.Philips, CMO, AUO, CPT, Toppan, and other flat-panel display and television manufacturers
Hawthorne, New York
Anvik Corporation has filed lawsuits against several major manufacturers of flat-panel displays and televisions and their U.S. subsidiaries, including Samsung Electronics Co. Ltd. (Korea), Sharp Corporation (Japan), LG.Philips LCD Co., Ltd. (Korea), Chi Mei Optoelectronics (Taiwan), AU Optronics Corporation (Taiwan), Chunghwa Picture Tubes, Ltd. (Taiwan), Tatung Company (Taiwan), Toppan Printing Co., Ltd. (Japan), HannStar Display Corporation (Taiwan), Innolux Display Corporation (Taiwan), and AFPD PTE Ltd. (Singapore), for infringement of five Anvik patents that cover inventions in high-performance microlithography systems. Such systems are critical tools for manufacturing of microelectronics products, including flat-panel displays, televisions, semiconductor integrated circuits, and microelectronic packaging devices. The lawsuits were filed February 2, 2007 in the U.S. District Court for the Southern District of New York, White Plains Division.
The inventions described and claimed in the patents are incorporated in Anvik's own microlithography systems that enable cost-effective, high-volume manufacture of a wide array of microelectronic and display products.
Anvik, based in Hawthorne, New York, is a producer of advanced microlithography and photoablation systems for high-throughput manufacturing of microelectronic devices, flat-panel displays, and flexible electronics. Anvik has advanced the state of the art of microlithography and materials processing systems for microelectronics manufacturing, and has made and installed such equipment in the U.S. and abroad.
In these lawsuits, Anvik is represented by the law firms of Bernstein Litowitz Berger & Grossman, LLP and Cozen O'Connor.
For further information, send inquiy to: info@anvik.com
February 2006
Anvik president Kanti Jain elected Fellow of IEEE
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Washington, DC -- Dr. Kanti Jain, president of Anvik Corporation, has been conferred the title of IEEE Fellow by the Board of Directors of the Institute of Electrical and Electronics Engineers for his work on high-resolution excimer laser lithography. As presented in an IEEE press release: "An important part of the IEEE's mission is to recognize the professional achievements of its members. The Institute's highest honor is the rank of IEEE Fellow, bestowed on members who have contributed 'to the advancement or application of engineering science and technology'." The technology of excimer laser lithography was invented and developed by Dr. Jain at IBM in the 1980's and is now used worldwide in semiconductor chip production.
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January 2006
University of Illinois at Urbana-Champaign appoints Anvik president Kanti Jain Professor of Electrical and Computer Engineering
Urbana, IL -- Dr. Kanti Jain, president of Anvik Corporation, has been appointed Professor of Electrical and Computer Engineering at the University of Illinois at Urbana-Champaign. At Illinois, his objective is to initiate a number of new research programs that will advance the state-of-the-art in microelectronic, optoelectronic, microsystem and biophotonic devices by developing and exploiting novel micro/nano-fabrication technologies. These fabrication technologies will enable patterning and microstructuring of a variety of organic and inorganic materials -- including new polymers, semiconductors, metals, dielectrics and biological materials -- and producing structures, devices and systems previously not deemed possible. Dr. Jain will continue in his responsibility as president of Anvik Corporation.
See also: www.ece.uiuc.edu/faculty and Photonics, Microelectronics, and Microsystems Laboratory
October 5, 2005
Anvik files patent infringement lawsuit against Nikon
Hawthorne, New York
Anvik Corporation has filed a lawsuit against Nikon Corporation and two of its U.S. subsidiaries for infringement of six Anvik patents that cover inventions in high-performance microlithography systems. Such systems are critical tools for manufacturing of microelectronics products, including semiconductor integrated circuits, microelectronic packaging devices, and flat-panel displays. The lawsuit was filed September 8, 2005 in the U.S. District Court for the Southern District of New York, White Plains Division. Named defendants are Nikon Precision, Inc., Nikon Research Corporation of America, and Nikon Corporation.
The inventions described and claimed in the patents are incorporated in Anvik's own microlithography systems that enable cost-effective, high-volume manufacture of a wide array of microelectronic and display products.
Anvik, based in Hawthorne, New York, is a producer of advanced microlithography and photoablation systems for high-throughput manufacturing of microelectronic devices, flat-panel displays, and flexible electronics. Anvik has advanced the state of the art of microlithography and materials processing systems for microelectronics manufacturing, and has made and installed such equipment in the U.S. and abroad.
In these lawsuits, Anvik is represented by the law firms of Bernstein Litowitz Berger & Grossman, LLP and Cozen O'Connor.
For further information, send inquiry to: info@anvik.com
March 22, 2005
Anvik Corporation awarded its 50th patent
MASKLESS LITHOGRAPHY WITH MULTIPLEXED SPATIAL LIGHT MODULATORS
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Hawthorne, NY -- Anvik Corporation has been awarded its 50th patent. Issued on March 22, 2005 to inventor Kanti Jain, U.S. Pat. 6,870,554 describes recent advances made by Anvik in maskless lithography technology, especially directed toward high-throughput fabrication of sub-100 nm microelectronic devices. This patent further strengthens Anvik's intellectual property portfolio in micro- and nanolithography technology, which now includes 40 patents, of which 7 are in maskless lithography. Anvik's business in microelectronics manufacturing systems is based on a diverse patent portfolio that comprises major innovations in optical system designs, microlithography processes and tools, opto-mechanical devices, energy-efficiency technologies, and laser materials processing systems.
See: Patent Portfolio
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